Determination of oxygen concentration in silicon and germanium by infrared absorption / W.R. Thurber.
| Author/creator | Thurber, W. Robert |
| Other author | United States. National Bureau of Standards. |
| Other author | Institute for Applied Technology (U.S.). Electronic Technology Division. |
| Format | Book |
| Publication | [Washington, D.C.] : National Bureau of Standards, 1970. |
| Description | 20 pages : illustrations ; 26 cm |
| Subjects |
| Series | NBS technical note ; 529 NBS technical note ; 529. ^A4336 |
| General note | Electronic Technology Division, Institute for Applied Technology. |
| General note | Issued May 1970. |
| General note | Tables. |
| General note | GPO Historic Shelflist Project- publication not in hand. |
| General note | GPO Cataloging Record Distribution Program (CRDP). |
| Bibliography note | Includes bibliographical references (pages 14-15). |
| GPO item number | 0249-A |
| Govt. docs number | C 13.46:529 |