1997 2nd International Symposium on Plasma Process-Induced Damage 13-14 May 1997, Monterey, California, USA / editors, Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics.

Author/creator International Symposium on Plasma Process-Induced Damage
Format Electronic
Publication InfoSunnyvale, Calif. : Northern California Chapter of the American Vacuum Society,
Descriptioni, 259 p. : ill. ; 28 cm.
Supplemental ContentFull text available from IEEE Conference Proceedings Archive
Supplemental ContentFull text available from IEEE Electronic Library (IEL) Conference Proceedings
Supplemental ContentFull text available from IEEE Electronic Library (IEL)
Subjects
Semiconductor wafers--Defects. --Congresses.
Semiconductors--Effect of radiation on. --Congresses.
Plasma etching--Congresses.

Other author/creatorCheung, Kin P.
Other author/creatorNakamura, Moritaka.
Other author/creatorGabriel, Calvin T.
Other author/creatorIEEE Electron Devices Society.
Other author/creatorAmerican Vacuum Society.
Other author/creatorŌyō Butsuri Gakkai.
Other author/creatorIEEE Xplore (Online service)
Portion of title P2ID
Portion of title 2nd International Symposium on Plasma Process-Induced Damage
General note"IEEE catalog no. 97TH8265"--T.p. verso.
Bibliography noteIncludes bibliographical references and index.
Access restrictionAvailable only to authorized users.
Technical detailsMode of access: World Wide Web
Genre/formElectronic books.
LCCN 97065930
ISBN0965157717 (softbound)
ISBN0780338227 (microfiche)

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Electronic Resources ✔ Available