1999 4th International Symposium on Plasma Process-Induced Damage May 9-11, 1999, Monterey, California, USA / Thuy Dao, Mitsumasa Koyanagi, and Terence Hook, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics.

Author/creator International Symposium on Plasma Process-Induced Damage
Format Electronic
Publication InfoSunnyvale, CA : Northern California Chapter of the American Vacuum Society,
Description211 p. : ill. ; 28 cm.
Supplemental ContentFull text available from IEEE Electronic Library (IEL)
Supplemental ContentFull text available from IEEE Electronic Library (IEL) Conference Proceedings
Supplemental ContentFull text available from IEEE Conference Proceedings Archive
Subjects
Semiconductor wafers--Congresses.
Semiconductors--Effect of radiation on. --Congresses.
Plasma radiation--Congresses.

Other author/creatorDao, Leanne Thuy Lien, 1958-
Other author/creatorKoyanagi, Mitsumasa.
Other author/creatorHook, Terence.
Other author/creatorIEEE Electron Devices Society.
Other author/creatorAmerican Vacuum Society.
Other author/creatorŌyō Butsuri Gakkai.
Other author/creatorIEEE Xplore (Online service)
Portion of title 4th International Symposium on Plasma Process-Induced Damage
Portion of title Fourth International Symposium on Plasma Process-Induced Damage
General note"IEEE catalog no. 99TH8395"--T.p. verso.
Bibliography noteIncludes bibliographical references and index.
Access restrictionAvailable only to authorized users.
Technical detailsMode of access: World Wide Web
Genre/formElectronic books.
LCCN 98068111
ISBN0965157733 (softbound)

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