Oxygen in Silicon: Vol. 42.
| Author/creator | Shimura, Fumio Volume Editor |
| Other author | Beer, Albert C. Contribution by |
| Other author | Weber, Eicke R. Contribution by |
| Other author | Willardson, Robert K. Contribution by |
| Format | Electronic |
| Publication Info | Academic Press [Imprint] San Diego : Elsevier Science & Technology Books |
| Description | 679 p. ill 22.900 x 015.200 cm. |
| Supplemental Content | Full text available from Book Series Backfile Package - Physics and Astronomy [YBPHAS] |
| Subjects |
| Series | Semiconductors and Semimetals Ser. |
| Summary | Annotation This volume reviews the latest understanding of the behavior and roles of oxygen in silicon, which will carry the field into the ULSI era from the experimental and theoretical points of view. The fourteen chapters, written by recognized authorities representing industrial and academic institutions, cover thoroughly the oxygen related phenomena from the crystal growth to device fabrication processes, as well as indispensable diagnostic techniques for oxygen. |
| Access restriction | Available only to authorized users. |
| Technical details | Mode of access: World Wide Web |
| Genre/form | Electronic books. |
| ISBN | 9780127521428 |
| ISBN | 0127521429 (Trade Cloth) Out of Stock Indefinitely |
| Standard identifier# | 9780127521428 |
| Stock number | 00991439 |