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010 a| 2003268804;

020 a| 0965157776 (softbound);

020 a| 0965157784 (CD-ROM);

035 a| (WaSeSS)ssj0000395895;

040 a| LHLc| LHLd| DLCd| WaSeSS;

042 a| lccopycat;

049 a| EREEa| NEHH;

050 00 a| TK7871.85b| .I5834 2002;

082 00 a| 621.3815/22| 22;

111 2 a| International Symposium on Plasma Process-Induced Damagen| (7th :d| 2002 :c| Maui, Hawaii)?| UNAUTHORIZED;

245 10 a| 2002 7th International Symposium on Plasma- and Process-Induced Damageh| [electronic resource] :b| June 5-7, 2002, Maui, Hawaii, USA /c| Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors ; technical co-sponsors, AVS, IEEE/Electron Devices Society, Japanese Society of Applied Physics.;

246 31 a| P2ID;

246 31 a| Plasma- and process-induced damage;

246 31 a| Plasma process induced-damage;

260 a| Santa Clara, California :b| AVS,;

300 a| [6], i, 177 p. :b| ill. ;c| 28 cm.;

500 a| Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.;

500 a| "P2ID"--Cover.;

500 a| "IEEE Catalog Number (softbound) 02TH8582 ; IEEE Catalog Number (CD-ROM) 02TH8582C"--verso of T.p.;

504 a| Includes bibliographic references and author index.;

506 a| Available only to authorized users.;

538 a| Mode of access: World Wide Web;

650 0 a| Semiconductor wafersv| Congresses.=| ^A444257;

650 0 a| Semiconductorsx| Effect of radiation onv| Congresses.=| ^A34420;

650 0 a| Plasma radiationv| Congresses.=| ^A442632;

655 0 a| Electronic books.=| ^A491897;

700 1 a| Hook, Terence.?| UNAUTHORIZED;

700 1 a| Eriguchi, Koji.?| UNAUTHORIZED;

700 1 a| Gabriel, Calvin T.?| UNAUTHORIZED;

710 2 a| American Vacuum Society.=| ^A190894;

710 2 a| IEEE Electron Devices Society.=| ^A85580;

710 2 a| Ōyō Butsuri Gakkai.=| ^A724770;

710 2 a| IEEE Xplore (Online service)=| ^A534875;

856 40 z| Full text available from IEEE Electronic Library (IEL) Conference Proceedingsu| https://go.openathens.net/redirector/ecu.edu?url=https%3A%2F%2Fieeexplore.ieee.org%2Fservlet%2Fopac%3Fpunumber%3D8079;

856 40 z| Full text available from IEEE Electronic Library (IEL)u| https://go.openathens.net/redirector/ecu.edu?url=https%3A%2F%2Fieeexplore.ieee.org%2Fservlet%2Fopac%3Fpunumber%3D8079;

947 a| (OCoLC)ocm50819437;

949 a| CLICK ON WEB ADDRESSw| ASISh| JOYNER188;

949 a| CLICK ON WEB ADDRESSw| ASISh| HSL77;

949 a| CLICK ON WEB ADDRESSw| ASISh| JMUSIC60;

596 a| 1 3 4;

998 a| 4666246;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 4666246-1001l| JNETm| JOYNERr| Ys| Yt| JNESSBKu| 3/19/2017x| EBOOKz| JERESOURCE;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 4666246-2001l| HSLELECm| HSLr| Ys| Yt| HEBKu| 3/19/2017x| EBOOKz| HERESOURCE;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 4666246-3001l| MNETm| JMUSICr| Ys| Yt| MNESSBKu| 3/19/2017x| EBOOKz| JERESOURCE;

2002 7th International Symposium on Plasma- and Process-Induced Damage June 5-7, 2002, Maui, Hawaii, USA / Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors ; technical co-sponsors, AVS, IEEE/Electron Devices Society, Japanese Society of Applied Physics.

Author/creator	International Symposium on Plasma Process-Induced Damage
Format	Electronic
Publication Info	Santa Clara, California : AVS,
Description	[6], i, 177 p. : ill. ; 28 cm.
Supplemental Content	Full text available from IEEE Electronic Library (IEL) Conference Proceedings
Supplemental Content	Full text available from IEEE Electronic Library (IEL)
Subjects	Semiconductor wafers--Congresses. Semiconductors--Effect of radiation on. --Congresses. Plasma radiation--Congresses.

Other author/creator	Hook, Terence.
Other author/creator	Eriguchi, Koji.
Other author/creator	Gabriel, Calvin T.
Other author/creator	American Vacuum Society.
Other author/creator	IEEE Electron Devices Society.
Other author/creator	Ōyō Butsuri Gakkai.
Other author/creator	IEEE Xplore (Online service)
Parallel title	P2ID
Parallel title	Plasma- and process-induced damage
Parallel title	Plasma process induced-damage
General note	Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.
General note	"P2ID"--Cover.
General note	"IEEE Catalog Number (softbound) 02TH8582 ; IEEE Catalog Number (CD-ROM) 02TH8582C"--verso of T.p.
Bibliography note	Includes bibliographic references and author index.
Access restriction	Available only to authorized users.
Technical details	Mode of access: World Wide Web
Genre/form	Electronic books.
LCCN	2003268804
ISBN	0965157776 (softbound)
ISBN	0965157784 (CD-ROM)

2002 7th International Symposium on Plasma- and Process-Induced Damage June 5-7, 2002, Maui, Hawaii, USA / Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors ; technical co-sponsors, AVS, IEEE/Electron Devices Society, Japanese Society of Applied Physics.

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