2002 International Conference on Simulation of Semiconductor Processes and Devices SISPAD 2002 : September 4-6, 2002, International Conference Center Kobe, Kobe, Japan / co-sponsored by Japan Society of Applied Physics, IEEE Electron Devices Society ; in cooperation with the Institute of Electronics, Information and Communication Engineers ... [et al.].

Author/creator International Conference on Simulation of Semiconductor Processes and Devices
Format Electronic
Publication InfoTokyo, Japan : Business Center for Academic Societies, Japan,
Descriptionxiv, 284 p. : ill. ; 30 cm.
Supplemental ContentFull text available from IEEE Electronic Library (IEL) Conference Proceedings
Supplemental ContentFull text available from IEEE Electronic Library (IEL)
Subjects

Other author/creatorŌyō Butsuri Gakkai.
Other author/creatorIEEE Electron Devices Society.
Other author/creatorDenshi Jōhō Tsūshin Gakkai (Japan)
Other author/creatorIEEE Xplore (Online service)
Portion of title Simulation of semiconductor processes and devices
Portion of title SISPAD 2002
General note"JSAP Catalog Number. AP21232 ; IEEE Catalog Number. 02TH8621"--T.p. verso.
Bibliography noteIncludes bibliographical references and author index.
Access restrictionAvailable only to authorized users.
Other formsAlso available via the World Wide Web with additional title: Simulation of semiconductor processes and devices, 2002, SISPAD 2002, International Conference on.
Technical detailsMode of access: World Wide Web
Genre/formElectronic books.
LCCN 2003544513
ISBN4891140275

Availability

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Electronic Resources ✔ Available