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010 a| 2002116918;

020 a| 0780377478 (softbound ed.);

035 a| (WaSeSS)ssj0000395896;

040 a| LHLc| LHLd| DLCd| WaSeSS;

042 a| lccopycat;

049 a| EREEa| NEHH;

050 00 a| TK7871.85b| .I5834 2003;

082 00 a| 621.3815/22| 22;

111 2 a| International Symposium on Plasma Process-Induced Damagen| (8th :d| 2003 :c| Corbeil-Essonnes, France)?| UNAUTHORIZED;

245 10 a| 2003 8th International Symposium on Plasma- and Process-Induced Damageh| [electronic resource] :b| April 24-25, 2003, Corbeil-Essonnes, France /c| Koji Eriguchi, S. Krishnan, and Terence Hook, editors ; [technical co-sponsors, IEEE/Electron Devices Society, Japanese Society of Applied Physics].;

246 31 a| P2ID;

246 31 a| Plasma- and process-induced damage;

246 31 a| Plasma process induced-damage;

260 a| Pisctaway, N.J. :b| IEEE,;

300 a| [vi], 189 p. :b| ill. ;c| 28 cm.;

500 a| Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.;

500 a| "P2ID"--Cover.;

500 a| "IEEE Catalog Number 03TH8669"--T.p. verso.;

504 a| Includes bibliographical references and author index.;

506 a| Available only to authorized users.;

538 a| Mode of access: World Wide Web;

650 0 a| Semiconductor wafersv| Congresses.=| ^A444257;

650 0 a| Semiconductorsx| Effect of radiation onv| Congresses.=| ^A34420;

650 0 a| Plasma radiationv| Congresses.=| ^A442632;

655 0 a| Electronic books.=| ^A491897;

700 1 a| Eriguchi, Koji.?| UNAUTHORIZED;

700 1 a| Krishnan, S.?| UNAUTHORIZED;

700 1 a| Hook, Terence.?| UNAUTHORIZED;

710 2 a| IEEE Electron Devices Society.=| ^A85580;

710 2 a| Ōyō Butsuri Gakkai.=| ^A724770;

710 2 a| IEEE Xplore (Online service)=| ^A534875;

856 40 z| Full text available from IEEE Electronic Library (IEL)u| https://go.openathens.net/redirector/ecu.edu?url=https%3A%2F%2Fieeexplore.ieee.org%2Fservlet%2Fopac%3Fpunumber%3D8537;

856 40 z| Full text available from IEEE Electronic Library (IEL) Conference Proceedingsu| https://go.openathens.net/redirector/ecu.edu?url=https%3A%2F%2Fieeexplore.ieee.org%2Fservlet%2Fopac%3Fpunumber%3D8537;

947 a| (OCoLC)ocm52192967;

949 a| CLICK ON WEB ADDRESSw| ASISh| JOYNER188;

949 a| CLICK ON WEB ADDRESSw| ASISh| HSL77;

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596 a| 1 3 4;

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999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 4666344-1001l| JNETm| JOYNERr| Ys| Yt| JNESSBKu| 3/19/2017x| EBOOKz| JERESOURCE;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 4666344-2001l| HSLELECm| HSLr| Ys| Yt| HEBKu| 3/19/2017x| EBOOKz| HERESOURCE;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 4666344-3001l| MNETm| JMUSICr| Ys| Yt| MNESSBKu| 3/19/2017x| EBOOKz| JERESOURCE;

2003 8th International Symposium on Plasma- and Process-Induced Damage April 24-25, 2003, Corbeil-Essonnes, France / Koji Eriguchi, S. Krishnan, and Terence Hook, editors ; [technical co-sponsors, IEEE/Electron Devices Society, Japanese Society of Applied Physics].

Author/creator	International Symposium on Plasma Process-Induced Damage
Format	Electronic
Publication Info	Pisctaway, N.J. : IEEE,
Description	[vi], 189 p. : ill. ; 28 cm.
Supplemental Content	Full text available from IEEE Electronic Library (IEL)
Supplemental Content	Full text available from IEEE Electronic Library (IEL) Conference Proceedings
Subjects	Semiconductor wafers--Congresses. Semiconductors--Effect of radiation on. --Congresses. Plasma radiation--Congresses.

Other author/creator	Eriguchi, Koji.
Other author/creator	Krishnan, S.
Other author/creator	Hook, Terence.
Other author/creator	IEEE Electron Devices Society.
Other author/creator	Ōyō Butsuri Gakkai.
Other author/creator	IEEE Xplore (Online service)
Parallel title	P2ID
Parallel title	Plasma- and process-induced damage
Parallel title	Plasma process induced-damage
General note	Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.
General note	"P2ID"--Cover.
General note	"IEEE Catalog Number 03TH8669"--T.p. verso.
Bibliography note	Includes bibliographical references and author index.
Access restriction	Available only to authorized users.
Technical details	Mode of access: World Wide Web
Genre/form	Electronic books.
LCCN	2002116918
ISBN	0780377478 (softbound ed.)

Availability

Library	Location	Call Number	Status	Item Actions
	Electronic Resources	Online Content Full text available from IEEE Electronic Library (IEL) Full text available from IEEE Electronic Library (IEL)	✔ Available

2003 8th International Symposium on Plasma- and Process-Induced Damage April 24-25, 2003, Corbeil-Essonnes, France / Koji Eriguchi, S. Krishnan, and Terence Hook, editors ; [technical co-sponsors, IEEE/Electron Devices Society, Japanese Society of Applied Physics].

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