1996 1st International Symposium on Plasma Process-Induced Damage 13-14 May 1996, Santa Clara, California, USA / Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics.

Author/creator International Symposium on Plasma Process-Induced Damage
Format Electronic
Publication InfoSunnyvale, CA : Northern California Chapter of the American Vacuum Society,
Description237 p. : ill. ; 28 cm.
Supplemental ContentFull text available from IEEE Electronic Library (IEL) Conference Proceedings
Supplemental ContentFull text available from IEEE Conference Proceedings Archive
Supplemental ContentFull text available from IEEE Electronic Library (IEL)
Subjects
Semiconductor wafers--Congresses.
Semiconductors--Effect of radiation on. --Congresses.
Plasma radiation--Congresses.

Other author/creatorCheung, Kin P.
Other author/creatorNakamura, Moritaka.
Other author/creatorGabriel, Calvin T.
Other author/creatorIEEE Electron Devices Society.
Other author/creatorAmerican Vacuum Society.
Other author/creatorŌyō Butsuri Gakkai.
Other author/creatorIEEE Xplore (Online service)
General note"IEEE catalog no. 96TH8142"--T.p. verso.
Bibliography noteIncludes bibliographical references and index.
Access restrictionAvailable only to authorized users.
Technical detailsMode of access: World Wide Web
Genre/formElectronic books.
LCCN 96068444
ISBN0965157709 (softbound)
ISBN0780330617 (microfiche)

Availability

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Electronic Resources ✔ Available