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010 a| 2012554564;

020 a| 9783527410668 (hbk.);

020 a| 352741066X (hbk.);

020 z| 9783527639564 (ePDF);

020 z| 9783527639540 (oBook);

020 z| 9783527639557 (ePub);

035 a| (WaSeSS)ssib043236754;

049 a| EREEa| NEHH;

050 00 a| MLCM 2017/44105 (T);

245 00 a| Mechanical stress on the nanoscaleh| [electronic resource] :b| simulation, material systems and characterization techniques /c| edited by Margrit Hanbücken, Pierre Müller, Ralf B. Wehrspohn.;

260 a| Weinheim :b| Wiley-VCH Verlag Gmbh & Co. KGaA,c| [2011];

300 a| xxi, 358 pages :b| illustrations (some color) ;c| 24 cm;

500 a| Minimal Level Cataloging Plus.5| DLC;

504 a| Includes bibliographical references and index.;

505 0 a| Elastic strain relaxation : thermodynamics and kinetics / Frank Glas -- Fundamentals of stress and strain at the nanoscale level : toward nanoelasticity / Pierre Müller -- Onset of plasticity in crystalline nanomaterials / Laurent Pizzagalli, Sandrine Brochard, and Julien Godet -- Relaxations on the nanoscale : an atomistic view by numerical simulations / Christine Mottet -- Accommodation of lattice misfit in semiconductor heterostructure nanowires / Volker Schmidt and Joerg V. Wittemann -- Strained silicon nanodevices / Manfred Reiche ... [et al.] -- Stress-driven nanopatterning in metallic systems / Vincent Repain, Sylvie Rousset, and Shobhana Narasimhan -- Semiconductor templates for the fabrication of nano-objects / Joël Eymery ... [et al.] -- Strain analysis in transmission electron microscopy : how far can we go? / Anne Ponchet ... [et al.] -- Determination of elastic strains using electron backscatter diffraction in the scanning electron microscope / Michael Krause, Matthias Petzold, and Ralf B. Wehrspohn -- X-ray diffraction analysis of elastic strains at the nanoscale / Olivier Thomas ... [et al.] -- Diffuse x-ray scattering at low-dimensional structures in the system SiGe/Si / Michael Hanke -- Direct measurement of elastic displacement modes by grazing incidence x-ray diffraction / Geoffroy Prévot -- Submicrometer-scale characterization of solar silicon by Raman spectroscopy / Michael Becker, George Sarau, and Silke Christiansen -- Strain-induced nonlinear optics in silicon / Clemens Schriever, Christian Bohley, and Ralf B. Wehrspohn.;

506 a| Available only to authorized users.;

520 a| A comprehensive overview of the current level of stress engineering on the nanoscale combining the theoretical fundamentals with simulation methods, model systems and characterization techniques.;

538 a| Mode of access: World Wide Web;

650 0 a| Nanostructured materials.=| ^A584488;

650 0 a| Strains and stresses.=| ^A19180;

650 0 a| Semiconductors.=| ^A16124;

655 0 a| Electronic books.=| ^A491897;

700 1 a| Hanbücken, Margrit.=| ^A1079924;

856 40 z| Full text available from Ebook Central - Academic Completeu| https://ebookcentral.proquest.com/lib/eastcarolina/detail.action?docID=827027;

949 a| CLICK ON WEB ADDRESSw| ASISh| JOYNER188;

949 a| CLICK ON WEB ADDRESSw| ASISh| HSL77;

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999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 5575842-2001l| HSLELECm| HSLr| Ys| Yt| HEBKu| 3/17/2021x| EBOOKz| HERESOURCE;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 5575842-3001l| MNETm| JMUSICr| Ys| Yt| MNESSBKu| 3/17/2021x| EBOOKz| JERESOURCE;

Mechanical stress on the nanoscale simulation, material systems and characterization techniques / edited by Margrit Hanbücken, Pierre Müller, Ralf B. Wehrspohn.

Other author	Hanbücken, Margrit.
Format	Electronic
Publication Info	Weinheim : Wiley-VCH Verlag Gmbh & Co. KGaA, [2011]
Description	xxi, 358 pages : illustrations (some color) ; 24 cm
Supplemental Content	Full text available from Ebook Central - Academic Complete
Subjects	Nanostructured materials. Strains and stresses. Semiconductors.

Contents	Elastic strain relaxation : thermodynamics and kinetics / Frank Glas -- Fundamentals of stress and strain at the nanoscale level : toward nanoelasticity / Pierre Müller -- Onset of plasticity in crystalline nanomaterials / Laurent Pizzagalli, Sandrine Brochard, and Julien Godet -- Relaxations on the nanoscale : an atomistic view by numerical simulations / Christine Mottet -- Accommodation of lattice misfit in semiconductor heterostructure nanowires / Volker Schmidt and Joerg V. Wittemann -- Strained silicon nanodevices / Manfred Reiche ... [et al.] -- Stress-driven nanopatterning in metallic systems / Vincent Repain, Sylvie Rousset, and Shobhana Narasimhan -- Semiconductor templates for the fabrication of nano-objects / Joël Eymery ... [et al.] -- Strain analysis in transmission electron microscopy : how far can we go? / Anne Ponchet ... [et al.] -- Determination of elastic strains using electron backscatter diffraction in the scanning electron microscope / Michael Krause, Matthias Petzold, and Ralf B. Wehrspohn -- X-ray diffraction analysis of elastic strains at the nanoscale / Olivier Thomas ... [et al.] -- Diffuse x-ray scattering at low-dimensional structures in the system SiGe/Si / Michael Hanke -- Direct measurement of elastic displacement modes by grazing incidence x-ray diffraction / Geoffroy Prévot -- Submicrometer-scale characterization of solar silicon by Raman spectroscopy / Michael Becker, George Sarau, and Silke Christiansen -- Strain-induced nonlinear optics in silicon / Clemens Schriever, Christian Bohley, and Ralf B. Wehrspohn.
Abstract	A comprehensive overview of the current level of stress engineering on the nanoscale combining the theoretical fundamentals with simulation methods, model systems and characterization techniques.
General note	Minimal Level Cataloging Plus.
Bibliography note	Includes bibliographical references and index.
Access restriction	Available only to authorized users.
Technical details	Mode of access: World Wide Web
Genre/form	Electronic books.
LCCN	2012554564
ISBN	9783527410668 (hbk.)
ISBN	352741066X (hbk.)

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Mechanical stress on the nanoscale simulation, material systems and characterization techniques / edited by Margrit Hanbücken, Pierre Müller, Ralf B. Wehrspohn.

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