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LEADER 01199cam 2200337 a 4500

001 ocm31330483;

003 OCoLC;

005 20141212115429.0;

008 941004s1995 nyua b 001 0 eng ;

010 a| 94039696;

020 a| 0442010796;

035 a| (Sirsi) o31330483;

035 a| (OCoLC)31330483;

040 a| DLCc| DLCd| EREd| UtOrBLW;

049 a| EREE;

050 00 a| TK7836b| .S54 1995;

082 00 a| 621.3815/22| 20;

100 1 a| Sivaram, S.=| ^A360624;

245 10 a| Chemical vapor deposition :b| thermal and plasma deposition of electronic materials /c| S. Sivaram.;

300 a| xii, 292 pages :b| illustrations ;c| 24 cm;

336 a| text2| rdacontent;

337 a| unmediated2| rdamedia;

338 a| volume2| rdacarrier;

504 a| Includes bibliographical references and index.;

650 0 a| Microelectronics industry.=| ^A226786;

650 0 a| Chemical vapor deposition.=| ^A362399;

650 0 a| Microelectronicsx| Materials.=| ^A35901;

596 a| 1;

998 a| 574305;

999 a| TK7836 .S54 1995w| LCc| 1i| 30372008903079d| 4/3/2013e| 2/27/1996f| 4/3/2013g| 2l| JGESm| JOYNERn| 1p| $64.95r| Ys| Yt| JGESBKu| 3/24/1995x| BOOKz| JSTACKSo| .STAFF. 0;

Chemical vapor deposition : thermal and plasma deposition of electronic materials / S. Sivaram.

Author/creator	Sivaram, S.
Format	Book
Publication Info	New York : Van Nostrand Reinhold, ©1995.
Description	xii, 292 pages : illustrations ; 24 cm
Subjects	Microelectronics industry. Chemical vapor deposition. Microelectronics--Materials.

Bibliography note	Includes bibliographical references and index.
LCCN	94039696
ISBN	0442010796

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Library	Location	Call Number	Status	Item Actions
Joyner	General Stacks	TK7836 .S54 1995	✔ Available	Place Hold

Chemical vapor deposition : thermal and plasma deposition of electronic materials / S. Sivaram.

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