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245 00 a| Developments in surface contamination and cleaningh| [electronic resource] :b| fundamentals and applied aspects /c| edited by Rajiv Kohli and K. L. Mittal.;

250 a| Second edition.;

260 a| Amsterdam [Netherlands] ;a| San Diego, CA :b| William Andrew,c| [2016];

300 a| xxii, 873 pages :b| illustrations ;c| 23 cm.;

490 0 a| Developments in Surface Contamination and Cleaning Series ;v| volume 1;

504 a| Includes bibliographical references and index.;

505 0 a| The Physical Nature of Very, Very Small Particles and its Impact on their Behavior / Othmar Preining -- Transport and Deposition of Aerosol Particles / Daniel J. Rader and Anthony S. Geller -- Relevance of Particle Transport in Surface Deposition and Cleaning / Chao-Hsin Lin and Chao Zhu -- Aspects of Particle Adhesion and Removal / David J. Quesnel, Donald S. Rimai, David M. Schaefer, Stephen P. Beaudoin, Aaron Harrison, Darby Hoss, Melissa Sweat, and Myles Thomas -- Tribological Implication of Particles / Koji Kato -- ESD Controls in Cleanroom Environments : Relevance to Particle Deposition / Larry Levit and Arnold Steinman -- Airborne Molecular Contamination : Contamination on Substrates and the Environment in Semiconductors and Other Industries / Taketoshi Fujimoto, Kikuo Takeda, and Tatsuo Nonaka -- Surface Analysis Methods for Contaminant Identification / David A. Cole, Sachin Attavar, and Lei Zhang -- Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles / Zhong Lin Wang and Jean L. Lee -- Wettability Techniques to Monitor the Cleanliness of Surfaces / Darren L. Williams and Kashmiri L. Mittal -- Cleaning with Solvents / John B. Durkee -- Removal of Particles by Chemical Cleaning / Philip G. Clark and Thomas J. Wagener -- The Use of Surfactants to Enhance Particle Removal from Surfaces / Michael L. Free -- Microabrasive Technology for Precision Cleaning and Processing / Rajiv Kohli -- Cleaning Using High-Speed Impinging Jet / Kuniaki Gotoh -- Carbon Dioxide Snow Cleaning / Robert Sherman -- Cleaning Using Argon/Nitrogen Cryogenic Aerosols / Wayne T. McDermott and Jeffery W. Butterbaugh -- Coatings for Prevention or Deactivation of Biological Contaminants / Joerg C. Tiller -- A Detailed Study of Semiconductor Wafer Drying / Wim Fyen, Frank Holsteyns, Twan Bearda, Sophia Arnauts, Jan Van Steenbergen, Geert Doumen, Karine Kenis, and Paul W. Mertens.;

506 a| Available only to authorized users.;

538 a| Mode of access: World Wide Web;

650 0 a| Surface contamination.=| ^A213059;

650 0 a| Surfaces (Technology)=| ^A23511;

655 0 a| Electronic books.=| ^A491897;

700 1 a| Kohli, Rajiv,d| 1947-?| UNAUTHORIZED;

700 1 a| Mittal, K. L.,d| 1945-=| ^A550214;

856 40 z| Full text available from eBook - Materials Science 2015 [EBCMS15]u| https://go.openathens.net/redirector/ecu.edu?url=https%3A%2F%2Fwww.sciencedirect.com%2Fscience%2Fbook%2F9780323299602;

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949 a| CLICK ON WEB ADDRESSw| ASISh| JMUSIC60;

596 a| 1 3 4;

998 a| 6130946;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 6130946-1001l| JNETm| JOYNERr| Ys| Yt| JNESSBKu| 5/15/2023x| EBOOKz| JERESOURCE;

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999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 6130946-3001l| MNETm| JMUSICr| Ys| Yt| MNESSBKu| 5/15/2023x| EBOOKz| JERESOURCE;

Developments in surface contamination and cleaning fundamentals and applied aspects / edited by Rajiv Kohli and K. L. Mittal.

Other author	Kohli, Rajiv, 1947-
Other author	Mittal, K. L., 1945-
Format	Electronic
Edition	Second edition.
Publication Info	Amsterdam [Netherlands] ; San Diego, CA : William Andrew, [2016]
Description	xxii, 873 pages : illustrations ; 23 cm.
Supplemental Content	Full text available from eBook - Materials Science 2015 [EBCMS15]
Subjects	Surface contamination. Surfaces (Technology)

Series	Developments in Surface Contamination and Cleaning Series ; volume 1
Contents	The Physical Nature of Very, Very Small Particles and its Impact on their Behavior / Othmar Preining -- Transport and Deposition of Aerosol Particles / Daniel J. Rader and Anthony S. Geller -- Relevance of Particle Transport in Surface Deposition and Cleaning / Chao-Hsin Lin and Chao Zhu -- Aspects of Particle Adhesion and Removal / David J. Quesnel, Donald S. Rimai, David M. Schaefer, Stephen P. Beaudoin, Aaron Harrison, Darby Hoss, Melissa Sweat, and Myles Thomas -- Tribological Implication of Particles / Koji Kato -- ESD Controls in Cleanroom Environments : Relevance to Particle Deposition / Larry Levit and Arnold Steinman -- Airborne Molecular Contamination : Contamination on Substrates and the Environment in Semiconductors and Other Industries / Taketoshi Fujimoto, Kikuo Takeda, and Tatsuo Nonaka -- Surface Analysis Methods for Contaminant Identification / David A. Cole, Sachin Attavar, and Lei Zhang -- Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles / Zhong Lin Wang and Jean L. Lee -- Wettability Techniques to Monitor the Cleanliness of Surfaces / Darren L. Williams and Kashmiri L. Mittal -- Cleaning with Solvents / John B. Durkee -- Removal of Particles by Chemical Cleaning / Philip G. Clark and Thomas J. Wagener -- The Use of Surfactants to Enhance Particle Removal from Surfaces / Michael L. Free -- Microabrasive Technology for Precision Cleaning and Processing / Rajiv Kohli -- Cleaning Using High-Speed Impinging Jet / Kuniaki Gotoh -- Carbon Dioxide Snow Cleaning / Robert Sherman -- Cleaning Using Argon/Nitrogen Cryogenic Aerosols / Wayne T. McDermott and Jeffery W. Butterbaugh -- Coatings for Prevention or Deactivation of Biological Contaminants / Joerg C. Tiller -- A Detailed Study of Semiconductor Wafer Drying / Wim Fyen, Frank Holsteyns, Twan Bearda, Sophia Arnauts, Jan Van Steenbergen, Geert Doumen, Karine Kenis, and Paul W. Mertens.
Bibliography note	Includes bibliographical references and index.
Access restriction	Available only to authorized users.
Technical details	Mode of access: World Wide Web
Genre/form	Electronic books.
LCCN	2016461234
ISBN	9780323299602

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