Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A. / editors, Rafael Reif [and others].

Other author Reif, Rafael.
Other author Symposium on Environmental, Safety, and Health (ESH) Issues in IC Production (1996 : Boston, Mass.)
Format Book
Publication InfoPittsburgh, Pa. : Materials Research Society, 1997.
Descriptionix, 154 pages : illustrations ; 24 cm.
Subjects
Semiconductor industry--Safety measures. --Congresses.
Integrated circuits industry--Safety measures. --Congresses.
Manufacturing processes--Safety measures. --Congresses.
Green technology--Congresses.

SeriesMaterials Research Society symposia proceedings ; v. 447
Materials Research Society symposia proceedings v. 447. ^A346462
Contents In situ monitoring of HF reprocessing in an industrial scale recirculator bath / A.J. Reddy ... [et al.] -- Anhydrous HF processing as an alternative to HF/water processes / J. Staffa ... [et al.] -- Minimization of DI water consumption in wet clean rinse tanks / J. Cook -- The implementation of dilute chemistries in semiconductor manufacturing / Ron Sanders, Fuyu Lin, and Pat Schay -- *PFC emission control options for plasma processing tools : a current assessment / M.T. Mocella -- Perhalogenated organic byproducts from plasma etching processes and their effects on human health and environmental impact / S. Bauer and I. Wolff -- Environmental issues of perfluorocompounds in the semiconductor industry / Jeffrey D. Williams -- Effectiveness of an inwardly fired burner on abatement of PFCs / A.M. Pierce and J. Van Gompel -- Gas stream analysis and PFC recovery in a semicomductor process / J.A.B. Van Hoeymissen ... [et al.] -- An integrated approach for the safe handling of hydrides / J.R. Shealy ... [et al.] -- Plasma etching of silicon dioxide and silicon nitride with nonperfluorocompound chemistries : trifluoroacetic anhydride and iodofluorocarbons / Simon M. Karecki, Laura C. Pruette, and L. Rafael Reif -- Next generation processes and equipment that leads to positive environment, safety, and health impacts / Phyllis Pei and H. Ray Kerby -- Parallel downflow rinse ; water saving technology in water rinse / Y. Hiratsuka and N. Fujikawa -- A technique for measuring slurry-flow dynamics during chemical mechanical polishing / J. Coppeta ... [et al.] -- A plasma reactor for solid waste treatment on PECVD production systems / S. Raoux ... [et al.] -- Measurement of arsenic emission from doped Czochralski silicon crystal growing operation / D. Sinha ... [et al.] -- *Chlorine precursors for gate oxidation processes / M.J. McGeary ... [et al.] -- Photoresist polymer mask formed from aqueous phase via polymerization in a two-dimensional surfactant template / P.D. Newman, G.K. Newman, and J.H. Harwell -- An integrated chemical-microbiological approach for the disposal of waste thin-film cadmium telluride photovoltaic modules / K.M. Paknikar ... [et al.] -- Point-of-use silicon sources for CVD / D.A. Saulys ... [et al.] -- Safe precursor gas for broad replacement of SiH₄ in plasma processes employed in integrated circuit production / M.J. Loboda ... [et al.].
Bibliography noteIncludes bibliographical references and index.
LCCN 97011466
ISBN1558993517

Availability

Library Location Call Number Status Item Actions
Joyner General Stacks TK7836 .E58 1997 ✔ Available Place Hold