Modeling of Film Deposition for Microelectronic Applications.

Author/creator Rossnagel, Stephen Editor
Format Electronic
Publication InfoAcademic Press [Imprint] San Diego : Elsevier Science & Technology Books
Description290 p. ill 22.900 x 015.200 cm.
Supplemental ContentFull text available from eBook - Materials Science pre-2007
Subjects

Other author/creatorUlman, Abraham Contribution by
Other author/creatorFrancombe, Maurice H. Contribution by
Other author/creatorVossen, John Editor
Other author/creatorPowell, Ronald Contribution by
SeriesAdvances in Research and Development Ser.
Summary Annotation Physics of Thin Filmsis one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Filmsto Thin Films.
Access restrictionAvailable only to authorized users.
Technical detailsMode of access: World Wide Web
Genre/formElectronic books.
ISBN9780125330220
ISBN0125330227 (Trade Cloth) Out of Stock Indefinitely
Standard identifier# 9780125330220
Stock number00991439

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