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003 OCoLC;

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035 a| (Sirsi) o51616296;

035 a| (OCoLC)51616296;

049 a| ERE$;

074 a| 0247-D (MF);

086 0 a| C 13.58:6701;

245 00 a| Interferometric metrology of photomask blanks :b| approaches using 633 nm wavelength /c| C.J. Evans [and others].;

260 a| Gaithersburg, MD :b| U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology,c| [2002];

300 a| 11 pages :b| illustrations ;c| 28 cm.;

336 a| text2| rdacontent;

337 a| microform2| rdamedia;

338 a| microfiche2| rdacarrier;

490 1 a| NISTIR ;v| 6701;

500 a| "December 21, 2000.";

500 a| Shipping list no.: 2003-0057-M.;

504 a| Includes bibliographical references (p. 10-11).;

520 a| "The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.;

650 0 a| Interferometry.=| ^A168214;

650 0 a| Photolithography.=| ^A151248;

650 0 a| Optical measurements.=| ^A29826;

650 0 a| Optical instrumentsx| Testing.=| ^A46989;

700 1 a| Evans, C. J.?| UNAUTHORIZED;

710 2 a| National Institute of Standards and Technology (U.S.)=| ^A259859;

830 0 a| NISTIR ;v| 6701.=| ^A682451;

596 a| 1;

998 a| 899579;

999 a| C 13.58:6701w| SUDOCc| 1i| 40372000133640d| 2/6/2003l| JDOMIm| JOYNERr| Ys| Yt| JDOFMIu| 2/4/2003x| MICROFORMz| JFEDDOCSo| .STAFF. 0;

Interferometric metrology of photomask blanks : approaches using 633 nm wavelength / C.J. Evans [and others].

Other author	Evans, C. J.
Other author	National Institute of Standards and Technology (U.S.)
Format	Microform
Publication Info	Gaithersburg, MD : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, [2002]
Description	11 pages : illustrations ; 28 cm.
Subjects	Interferometry. Photolithography. Optical measurements. Optical instruments--Testing.

Series	NISTIR ; 6701 NISTIR ; 6701. ^A682451
Abstract	"The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.
General note	"December 21, 2000."
General note	Shipping list no.: 2003-0057-M.
Bibliography note	Includes bibliographical references (p. 10-11).
Reproduction note	Joyner- Microfiche. [Washington, D.C.] : Supt. of Docs., U.S. G.P.O., 2002. 1 microfiche : negative.
GPO item number	0247-D (MF)
Govt. docs number	C 13.58:6701

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Library	Location	Call Number	Status	Item Actions
Joyner	Microforms B300	C 13.58:6701	✔ Available

Interferometric metrology of photomask blanks : approaches using 633 nm wavelength / C.J. Evans [and others].

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