Accurate linewidth measurement on integrated-circuit photomasks / John M. Jerke, editor, Electron Devices Division, Center for Electronics and Electrical Engineering, National Engineering Laboratory, National Bureau of Standards.
| Format | Book |
| Publication Info | Washington, D.C. : U.S. Dept. of Commerce, National Bureau of Standards : U.S. Govt. Print. Off : For sale by the Supt. of Docs., U.S. Govt. Print. Off, 1980. |
| Description | x, 154 pages : illustrations ; 26 cm. |
| Subjects |
| Other author/creator | Jerke, John M. |
| Other author/creator | Center for Electronics and Electrical Engineering (U.S.). Electron Devices Division. |
| Other author/creator | United States. Defense Advanced Research Projects Agency. |
| Other author/creator | United States. National Bureau of Standards. |
| Series | NBS special publication ; 400-43 Semiconductor measurement technology Semiconductor measurement technology. ^A428054 NBS special publication 400-43. ^A2701 |
| General note | "Issued February 1980." |
| General note | "Supported by the Defense Advanced Research Projects Agency ... and the National Bureau of Standards." |
| Bibliography note | Includes bibliographical references. |
| LCCN | 79600191 |
| Govt. docs number | C 13.10:400-43 |
Availability
| Library | Location | Call Number | Status | Item Actions |
|---|---|---|---|---|
| Joyner | Fed Docs Stacks | C 13.10:400-43 | ✔ Available | Place Hold |