A production-compatible microelectronic test pattern for evaluating photomask misalignment / T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.
| Author/creator | Russell, T. J., 1943- |
| Other author | Maxwell, Dwight A., author. |
| Other author | United States. National Bureau of Standards. |
| Other author | United States. Advanced Research Projects Agency. |
| Format | Book |
| Publication Info | Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off, 1979. |
| Description | iii, 28 pages : illustrations ; 26 cm. |
| Subjects |
| Series | NBS special publication ; 400-51 Semiconductor measurement technology Semiconductor measurement technology. ^A428054 NBS special publication 400-51. ^A2701 |
| Bibliography note | Includes bibliographical references. |
| LCCN | 79000230 |
| Govt. docs number | C 13.10:400-51 |
Availability
| Library | Location | Call Number | Status | Item Actions |
|---|---|---|---|---|
| Joyner | Fed Docs Stacks | C 13.10:400-51 | ✔ Available | Place Hold |