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Showing 61 - 70 of 729 results
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Influence of alumina reaction tube impurities on the oxidation of chemically-vapor-deposited silicon carbide
Joyner Library
- Microforms B300
Call Number:
NAS 1.15:111738
Applications of plasma processes to VLSI technology
Joyner Library
- General Stacks
Call Number:
TK7871.85 .H34713 1985
Criteria for significance of simultaneous presence of both condensible vapors and aerosol particles on mass transfer (deposition) rates
Joyner Library
- Microforms B300
Call Number:
NAS 1.15:87247
Compensation in epitaxial cubic SiC films
Joyner Library
- Microforms B300
Call Number:
NAS 1.15:87269
Surface passivation for III-V semiconductor processing
Joyner Library
- Microforms B300
Call Number:
NAS 1.15:106761
Friction and wear of ion-beam-deposited diamondlike carbon on chemical-vapor-deposited, fine-grain diamond
Joyner Library
- Microforms B300
Call Number:
NAS 1.15:107316
Surface design and engineering toward wear-resistant, self-lubricating diamond films and coatings
Joyner Library
- Microforms B300
Call Number:
NAS 1.15:208905
Surface design and engineering toward wear-resistant, self-lubricant diamond films and coatings
Joyner Library
- Microforms B300
Call Number:
NAS 1.15:107249/CH 10