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Cover image for Integrated circuit mask technology

Integrated circuit mask technology

Joyner Library - General Stacks
Call Number: HD9993.T693 U63 1997
Cover image for Accurate linewidth measurement on integrated-circuit photomasks

Accurate linewidth measurement on integrated-circuit photomasks

Joyner Library - Fed Docs Stacks
Call Number: C 13.10:400-43
Cover image for A production-compatible microelectronic test pattern for evaluating photomask misalignment

A production-compatible microelectronic test pattern for evaluating photomask misalignment

Joyner Library - Fed Docs Stacks
Call Number: C 13.10:400-51
Cover image for Optical and dimensional-measurement problems with photomasking in microelectronics

Optical and dimensional-measurement problems with photomasking in microelectronics

Joyner Library - Fed Docs Stacks
Call Number: C13.10:400-20
Cover image for Automated photomask inspection

Automated photomask inspection

Joyner Library - Fed Docs Stacks
Call Number: C 13.10:400-46
Cover image for Measurement assurance for dimensional measurements on integrated-circuit photomasks

Measurement assurance for dimensional measurements on integrated-circuit photomasks

Joyner Library - Microforms B300
Call Number: C 13.46:1164
Cover image for Extreme ultraviolet lithography

Extreme ultraviolet lithography

Location
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Cover image for Federal statutory protection for mask works

Federal statutory protection for mask works

Joyner Library - Fed Docs Stacks
Call Number: ASK AT REFERENCE DESK
Cover image for Antireflecting-chromium linewidth standard, SRM 473, for calibration of optical microscope linewidth measuring systems

Antireflecting-chromium linewidth standard, SRM 473, for calibration of optical microscope linewidth measuring systems

Joyner Library - Microforms B300
Call Number: C 13.10:260-129